To determine the electron concentration (n e) in the doped silicon after introducing indium, we can utilize the principle of charge neutrality, which states that the total positive charge must equal the total negative charge in a semiconductor. In pure silicon at 300 K, the electron concentration (n e) and hole concentration (n h) are equal, both being 2 x 10^16 per m³. When indium, a p-type dopant, is introduced, it increases the hole concentration to 4 x 10^22 per m³. Let's break down the calculations step by step.
Understanding Charge Neutrality
In a semiconductor, the relationship between electron and hole concentrations can be described by the equation:
Here, n i is the intrinsic carrier concentration of silicon, which at 300 K is approximately 1.5 x 10^10 per m³. This relationship holds true because the product of the electron and hole concentrations equals the square of the intrinsic carrier concentration.
Calculating the Initial Product of n e and n h
Initially, we have:
- n e = n h = 2 x 10^16 per m³
Thus, the product is:
- n e * n h = (2 x 10^16) * (2 x 10^16) = 4 x 10^32 per m^6
Applying the Doping Effect
After doping with indium, the hole concentration increases to:
Using the charge neutrality condition, we can express the new electron concentration (n e) as follows:
Substituting the known values:
- n e * (4 x 10^22) = (1.5 x 10^10)²
Calculating n i² gives:
- (1.5 x 10^10)² = 2.25 x 10^20 per m^6
Finding the New Electron Concentration
Now, we can rearrange the equation to solve for n e:
- n e = (2.25 x 10^20) / (4 x 10^22)
Calculating this gives:
- n e = 5.625 x 10^-3 per m³
Final Result
Therefore, the electron concentration in the doped silicon after introducing indium is approximately:
- n e ≈ 5.625 x 10^-3 per m³
This result illustrates how doping significantly alters the charge carrier concentrations in semiconductors, shifting the balance towards holes in the case of p-type doping. If you have any further questions about this topic or related concepts, feel free to ask!